Positive resist composition and pattern forming method using...

Details Positive resist composition and pattern forming method using... Positive resist composition and pattern forming method using...

2005-09-26

2008-08-12

Hamilton, Cynthia (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S176000, C430S326000, C430S907000

Reexamination Certificate

active

07410747

ABSTRACT:
A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising (A) a resin of which solubility in an alkali developer increases under the action of an acid, the resin containing a repeating unit having a specific styrene skeleton and a repeating unit having a specific ring structure, and (B) a compound of generating an acid upon irradiation with actinic rays or radiation; and a pattern forming method using the composition.

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European Search Report dated Dec. 7, 2005.

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