Manufacturing method of thick film member pattern

Details Manufacturing method of thick film member pattern Manufacturing method of thick film member pattern

2005-06-27

2008-10-07

Duda, Kathleen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S319000, C430S330000

Reexamination Certificate

active

07432040

ABSTRACT:
A method of manufacturing an image forming apparatus having a plurality of electron-emitting members, with row direction wires and column direction wires, in a matrix, and a dielectric layer between the row and column wires. A resist precursor layer is formed by imparting and drying a first photosensitive paste. A second precursor layer is formed by imparting a second photosensitive paste onto the first precursor layer, and by drying the second paste. A precursor pattern is formed by exposing a layered product of the first layer and the second layer through a mask. The exposed layered product is developed, and the dielectric layer is formed by baking the precursor pattern. A shrinkage ratio of the second layer after the baking to the second layer before the baking is larger than a shrinkage ratio of the first layer after the baking to the first layer before the baking.

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