Positive resist composition

Details Positive resist composition Positive resist composition

2004-06-16

2008-10-14

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100

Reexamination Certificate

active

07435527

ABSTRACT:
A positive resist composition comprising (A) a compound that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that is insoluble or hardly soluble in an alkali developing solution but becomes soluble in the alkali developing solution by the action of an acid, and (C) a compound having at least one group that is decomposed with an acid to generate a carboxylic acid and at least three groups selected from hydroxy group and substituted hydroxy group.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5609982 (1997-03-01), Sato et al.
patent: 5639587 (1997-06-01), Sato et al.
patent: 5849461 (1998-12-01), Hatakeyama et al.
patent: 5939234 (1999-08-01), Yamanaka et al.
patent: 5981140 (1999-11-01), Sato et al.
patent: 6022665 (2000-02-01), Watanabe et al.
patent: 6511785 (2003-01-01), Takemura et al.
patent: 6593056 (2003-07-01), Takeda et al.
patent: 6777158 (2004-08-01), Maemori et al.
patent: 6818380 (2004-11-01), Maemori et al.
patent: 7214465 (2007-05-01), Nakao et al.
patent: 2001/0035394 (2001-11-01), Takeda et al.
patent: 2002/0045133 (2002-04-01), Maemori et al.
patent: 2002/0058202 (2002-05-01), Maemori et al.
patent: 2002/0106580 (2002-08-01), Nitta et al.
patent: 2004/0067615 (2004-04-01), Maemori et al.
patent: 2004/0166433 (2004-08-01), Dammel et al.
patent: 2004/0166434 (2004-08-01), Dammel et al.
patent: 2005/0037291 (2005-02-01), Nitta et al.
patent: 2005/0170276 (2005-08-01), Nitta et al.
patent: 2-161436 (1990-06-01), None
patent: 5-232406 (1993-09-01), None
patent: 2002091001 (2002-03-01), None
English language machine translation of JP 2002-091001.

Affiliated with

Also associated with

Rating

Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3998728