Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2004-03-11
2008-10-07
Bella, Matthew C (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S145000, C382S274000, C382S275000
Reexamination Certificate
active
07433508
ABSTRACT:
In a pattern inspection apparatus for comparing images of corresponding areas of two patterns, which are formed so as to be identical, so as to judge that a non-coincident part of the images is a defect, the influence of unevenness in brightness of patterns caused by a difference of thickness or the like is reduced, whereby highly sensitive pattern inspection is realized. In addition, high-speed pattern inspection can be carried out without changing the image comparison algorithm. For this purpose, the pattern inspection apparatus operates to perform comparison processing of images in parallel in plural areas. Further, the pattern inspection apparatus operates to convert gradation of an image signal among compared images using different plural processing units such that, even in the case in which a difference of brightness occurs in an identical pattern among images, a defect can be detected correctly.
REFERENCES:
patent: 5051585 (1991-09-01), Koshishiba et al.
patent: 5153444 (1992-10-01), Maeda et al.
patent: 5649022 (1997-07-01), Maeda et al.
patent: 6169282 (2001-01-01), Maeda et al.
patent: 6876445 (2005-04-01), Shibuya et al.
patent: 6943876 (2005-09-01), Yoshida et al.
patent: 7113627 (2006-09-01), Cahill et al.
patent: 2002/0022185 (2002-02-01), Tanaka et al.
patent: 2002/0181756 (2002-12-01), Shibuya et al.
patent: 2003/0021462 (2003-01-01), Sakai et al.
patent: 2003/0081201 (2003-05-01), Shibata et al.
patent: 2003/0118217 (2003-06-01), Kondo et al.
patent: 2004/0240723 (2004-12-01), Sakai et al.
patent: 10048152 (1998-02-01), None
Maeda Shunji
Okabe Takafumi
Sakai Kaoru
Antonelli, Terry Stout & Kraus, LLP.
Bella Matthew C
Hitachi High-Technologies Corporation
Perungavoor Sath V.
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