Scanning electron microscope, method for measuring a...

Radiant energy – Inspection of solids or liquids by charged particles – Methods

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S306000, C250S309000, C250S310000, C250S311000, C250S399000, C250S492300

Reexamination Certificate

active

07408154

ABSTRACT:
As measurement accuracy required for the scanning electron microscope (SEM) for measuring a pattern width becomes stringent, a technique of reducing the difference in a measured dimension between the SEM's is desired. However, the conventional technique of evaluating the difference in a measured dimension between the SEM's cannot separate the difference in a measured dimension between the SEM's themselves and a dimensional change resulting from deformation of the pattern itself. Moreover, the technique of reducing the difference in a measured dimension between the SEM's needs an operator for reducing the difference in a measured dimension between the SEM's for each measurement pattern shape. In this invention, a pattern at the same position is measured for a plurality of times with each SEM, and a different between extrapolated values of measured values obtained by the respective SEM's is calculated, whereby separation between the difference in a measured dimension between the SEM's and a dimensional change resulting from deformation of the pattern itself is made possible. Moreover, matching electron beam image profiles between the SEM's using an operator that simulates a difference in beam diameter between the SEM's makes it possible to reduce the difference in a measured dimension between the SEM's, not depending on a dimensional measurement pattern shape.

REFERENCES:
patent: 3780853 (1973-12-01), Kuhn
patent: 4682301 (1987-07-01), Horiba et al.
patent: 5323003 (1994-06-01), Shido et al.
patent: 5646403 (1997-07-01), Mori et al.
patent: 5771318 (1998-06-01), Fang et al.
patent: 6366341 (2002-04-01), Shirato et al.
patent: 6384408 (2002-05-01), Yee et al.
patent: 6396059 (2002-05-01), Singh et al.
patent: 6462343 (2002-10-01), Choo
patent: 6538249 (2003-03-01), Takane et al.
patent: 6559446 (2003-05-01), Choo et al.
patent: 6573497 (2003-06-01), Rangarajan et al.
patent: 6573498 (2003-06-01), Rangarajan et al.
patent: 6653633 (2003-11-01), Takane et al.
patent: 6700122 (2004-03-01), Matsui et al.
patent: 6807314 (2004-10-01), Nikitin et al.
patent: 6936818 (2005-08-01), Takane et al.
patent: 6995847 (2006-02-01), Fashant et al.
patent: 7078691 (2006-07-01), Nakayama
patent: 7109485 (2006-09-01), Takane et al.
patent: 7164127 (2007-01-01), Nakagaki et al.
patent: 7209596 (2007-04-01), Nikitin
patent: 7216311 (2007-05-01), Tanaka et al.
patent: 2002/0081016 (2002-06-01), Oh
patent: 2003/0015660 (2003-01-01), Shishido et al.
patent: 2003/0136907 (2003-07-01), Takane et al.
patent: 2004/0069956 (2004-04-01), Takane et al.
patent: 2004/0156223 (2004-08-01), Tanaka et al.
patent: 2005/0141761 (2005-06-01), Lee et al.
patent: 2005/0184237 (2005-08-01), Takane et al.
patent: 2005/0199808 (2005-09-01), Obara et al.
patent: 2005/0205780 (2005-09-01), Nakagaki et al.
patent: 2005/0247860 (2005-11-01), Shishido et al.
patent: 2005/0285035 (2005-12-01), Mizuno et al.
patent: 2006/0060774 (2006-03-01), Oosaki et al.
patent: 2006/0091309 (2006-05-01), Oosaki et al.
patent: 2006/0108525 (2006-05-01), Nakagaki et al.
patent: 2006/0289756 (2006-12-01), Nakayama
patent: 2007/0114405 (2007-05-01), Oosaki et al.
patent: 2007/0187595 (2007-08-01), Tanaka et al.
patent: 2008/0067337 (2008-03-01), Oosaki et al.
patent: 2008/0067370 (2008-03-01), McCaffrey
“Spatial Filters—Gaussian Smoothing”, http://homepages.inf.ed.ac.uk/rbf/HIPR2/gsmooth.htm.
“Sobel”—Wikipedia, http://en.wikipedia.org/wiki.Sobel.
“Linear Filtering”, http://library.wolfram.com/examples/linearfiltering/.
Measurement Precision of CD-SEM for 65 nm Technology Node, Abe, et al, Process & Manufacturing Engineering Center, Toshiba Corp. Proc. of SPIE vol. 5375 pp. 929-939.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Scanning electron microscope, method for measuring a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Scanning electron microscope, method for measuring a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scanning electron microscope, method for measuring a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3994430

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.