Method for making a high current low profile inductor

Inductor devices – Core forms casing

Reexamination Certificate

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Reexamination Certificate

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07345562

ABSTRACT:
A high current, low profile inductor includes a conductor coil surrounded by magnetic material to form an inductor body. An inductor body is formed around the inductor coil and includes a resin and a magnetic material compressed while it is dry and surrounding the inside and the outside of the coil.

REFERENCES:
patent: 1994534 (1935-03-01), Robinson
patent: 2118291 (1938-05-01), Bollman
patent: 2154730 (1939-04-01), Cox
patent: 2391563 (1945-12-01), Goldberg
patent: 2457806 (1949-01-01), Crippa
patent: 2568169 (1951-09-01), Raczynski
patent: 2850707 (1958-09-01), Wroblewski
patent: 2966704 (1961-01-01), O'Brian
patent: 3201729 (1965-08-01), Blanchi
patent: 3235675 (1966-02-01), Blume
patent: 3255512 (1966-06-01), Lochner
patent: 3380004 (1968-04-01), Hansen
patent: 3554797 (1971-01-01), Coerver, Jr.
patent: 3678345 (1972-07-01), Hvidtfeld
patent: 3953251 (1976-04-01), Butherus et al.
patent: 4146854 (1979-03-01), Ishino
patent: 4177089 (1979-12-01), Bankson
patent: 4543554 (1985-09-01), Muellenheim
patent: 4601765 (1986-07-01), Soileau
patent: 4696100 (1987-09-01), Yamamoto
patent: 4776980 (1988-10-01), Ruffini
patent: 5023578 (1991-06-01), Kaneko
patent: 5034710 (1991-07-01), Kawaguchi
patent: 5160447 (1992-11-01), Ishikawa et al.
patent: 5184105 (1993-02-01), Endo
patent: 5291173 (1994-03-01), Yerman
patent: 5359311 (1994-10-01), Kawabata
patent: 5381124 (1995-01-01), Roshen
patent: 5398400 (1995-03-01), Breen
patent: 5414401 (1995-05-01), Roshen
patent: 5446428 (1995-08-01), Kumeji
patent: 5495213 (1996-02-01), Ikeda
patent: 5551146 (1996-09-01), Kawabata
patent: 5875541 (1999-03-01), Kumeji et al.
patent: 5884990 (1999-03-01), Burghartz
patent: 5912609 (1999-06-01), Usui
patent: 6063209 (2000-05-01), Matsutani
patent: 6198375 (2001-03-01), Shafer
patent: 6204744 (2001-03-01), Shafer
patent: 6305755 (2001-03-01), Shafer
patent: 6460244 (2002-10-01), Shafer
patent: 7081803 (2006-07-01), Takaya et al.
patent: 7265651 (2007-09-01), Brunner
patent: 2002/0017972 (2002-02-01), Hsu
patent: 179 582 (1935-09-01), None
patent: 364 451 (1922-11-01), None
patent: 1 370 019 (1936-03-01), None
patent: 1 764 087 (1971-04-01), None
patent: 2132378 (1973-01-01), None
patent: 28 11 227 (1978-09-01), None
patent: 40 23 141 (1992-01-01), None
patent: 0439389 (1991-07-01), None
patent: 0469609 (1992-05-01), None
patent: 2721431 (1995-12-01), None
patent: 2303494 (1997-02-01), None
patent: 55 77113 (1980-06-01), None
patent: 58 188108 (1983-11-01), None
patent: 185809 (1984-12-01), None
patent: 60 034008 (1985-02-01), None
patent: 62 013005 (1987-01-01), None
patent: 63 79306 (1988-04-01), None
patent: 1 266705 (1989-10-01), None
patent: 1 167011 (1989-11-01), None
patent: 04 15507 (1992-04-01), None
patent: 04129206 (1992-04-01), None
patent: HEI-04-115507 (1992-04-01), None
patent: 04196507 (1992-07-01), None
patent: 04 286305 (1992-10-01), None
patent: 4 373112 (1992-12-01), None
patent: 5 283238 (1993-10-01), None
patent: HEI-05-291046 (1993-11-01), None
patent: 6 61059 (1994-03-01), None
patent: 63 278317 (1998-11-01), None
patent: 92 05568 (1992-04-01), None
patent: WO 96/02345 (1996-02-01), None

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