Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-06-06
2008-09-02
Vu, David (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257S638000
Reexamination Certificate
active
07419897
ABSTRACT:
A method of fabricating an electrical connecting structure of a circuit board is disclosed. The method includes: providing a circuit board having a plurality of first and a plurality of second conductive pads; forming on the circuit board a solder mask having a plurality of openings to thereby expose the first and the second conductive pads; forming an metal adhesive layer on the first and the second conductive pads; forming a conductive layer on the circuit board and the metal adhesive layer; forming on the conductive layer a resistive layer, wherein a plurality of openings are formed in the resistive layer to expose the conductive layer on the second conductive pads; forming a metal post by electroplating through the conductive layer on the second conductive pads; removing the resistive layer and the conductive layer covered underneath; and forming a soldering layer on the metal post.
REFERENCES:
patent: 5400948 (1995-03-01), Sajja et al.
patent: 5672542 (1997-09-01), Schwiebert et al.
patent: 6258705 (2001-07-01), Chien et al.
patent: 6551917 (2003-04-01), Cobbley et al.
Phoenix Precision Technology Corporation
Sawyer Law Group LLP
Vu David
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