Photopolymerizable composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Details

430288, 430910, 430920, 430926, G03C 168

Patent

active

053288033

ABSTRACT:
A photopolymerizable composition developable with an alkali aqueous solution which comprises a carboxyl group-containing high polymer binder, a photopolymerizable monomer, a photopolymerization initiator system and a compound of a specific structure is disclosed. The photopolymerizable composition shows a good keeping stability in a state of lamination on a metal board and thus is highly useful in the production of, for example, dry films for print basic boards, photoresists, photomasks, lithograph boards and resin relief boards.

REFERENCES:
patent: 4282309 (1981-08-01), Laridon et al.
patent: 4543318 (1985-09-01), Maeda et al.
patent: 4904564 (1990-02-01), Chiong
patent: 4987054 (1991-01-01), Sondergeld et al.
patent: 5030548 (1991-07-01), Fujikuya et al.
patent: 5096799 (1992-03-01), Fujikura et al.

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