Method of forming stepped structures employing imprint...

Details Method of forming stepped structures employing imprint... Method of forming stepped structures employing imprint...

2008-07-08

2008-07-08

Alanko, Anita K (Department: 1792)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S011000, C216S013000, C216S017000, C216S019000, C216S039000, C216S041000, C216S044000, C216S047000, C216S049000, C216S052000, C438S700000, C438S703000, C430S311000, C430S316000, C430S317000

Reexamination Certificate

active

10423642

ABSTRACT:
The present invention provides a method for forming a stepped structure on a substrate that features transferring, into the substrate, an inverse shape of the stepped structure disposed on the substrate.

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