Positive resist composition and pattern forming method using...

Details Positive resist composition and pattern forming method using... Positive resist composition and pattern forming method using...

2008-05-20

2008-05-20

Chu, John S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S910000

Reexamination Certificate

active

11276990

ABSTRACT:
The invention provides a positive resist composition for the pattern formation by the use of actinic rays or radiation, ensuring that the sensitivity, resolution and pattern profile are good, the line edge roughness is small and the surface roughness is satisfied, and a pattern forming method using the composition, wherein the positive resist composition is a positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (B) a resin of which solubility in an alkali developer increases under the action of an acid, the resin comprising a specific repeating unit; and a pattern forming method using the composition.

REFERENCES:
patent: 6613492 (2003-09-01), Lee
patent: 6680157 (2004-01-01), Fedynyshyn
patent: 2002/0090568 (2002-07-01), Lee
patent: 2003/0129531 (2003-07-01), Oberlander et al.
patent: 2004/0058270 (2004-03-01), Iwai et al.
patent: 1480078 (2004-05-01), None
patent: 55-060503 (1980-05-01), None
patent: 2002-55457 (2002-02-01), None
patent: 2003-345023 (2003-12-01), None
European Search Report for EP 06005780 dated Oct. 9, 2007.

Affiliated with

Also associated with

Rating

Positive resist composition and pattern forming method using... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition and pattern forming method using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition and pattern forming method using... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3946517