Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2008-03-11
2008-03-11
Le, Dung A. (Department: 2818)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S780000, C438S099000, C438S508000, C438S508000
Reexamination Certificate
active
11280480
ABSTRACT:
Provided are a method of manufacturing an organic thin film transistor (TFT), the organic TFT manufactured using the method, and a flat panel display device comprising the organic TFT. The method includes: coating a lubricant on a predetermined region of a substrate where an organic semiconductor layer is not to be formed; coating an organic semiconductor layer on the entire substrate; heating the coated substrate to melt the lubricant; and releasing the organic semiconductor layer formed above the predetermined region from the substrate. According to the method, the organic semiconductor layer can be effectively patterned without damaging the substrate and the organic semiconductor material.
REFERENCES:
patent: 6498114 (2002-12-01), Amundson et al.
Koo Jae-Bon
Suh Min-Chul
Knobbe Martens Olson & Bear LLP
Le Dung A.
Samsung SDI & Co., Ltd.
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