Method and apparatus for characterizing a recess located on...

Details Method and apparatus for characterizing a recess located on... Method and apparatus for characterizing a recess located on...

2008-01-15

2008-01-15

Caputo, Lisa (Department: 2809)

Radiant energy

Inspection of solids or liquids by charged particles

C250S309000, C250S308000, C250S310000

Reexamination Certificate

active

10940490

ABSTRACT:
Method and apparatus for characterizing a recess located on a surface of a substrate are provided. One embodiment of the invention provides a method for characterizing a recess located on a surface of a substrate. In a first step, a measurement tip is positioned directly above the recess. Subsequently, an electrically conductive path is provided between the measurement tip and the bottom of the recess by ionizing a medium located in the recess. A voltage is applied between the measurement tip and the substrate to measure a current flowing between the measurement tip and the bottom of the recess. The recess is characterized on the basis of the magnitude of the measured current. Another embodiment of the invention provides an apparatus for performing the method for characterizing a recess.

REFERENCES:
patent: 6337479 (2002-01-01), Kley
patent: 6353219 (2002-03-01), Kley
patent: 6861648 (2005-03-01), Kley
patent: 6880388 (2005-04-01), Kley
patent: 6923044 (2005-08-01), Kley
patent: 7109482 (2006-09-01), Kley

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