System for coloring a partially colored design in an...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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Reexamination Certificate

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10710224

ABSTRACT:
A method of designing an alternating phase shifting mask for projecting an image of an integrated circuit design. Phase units are binary colorable within each unit of the hierarchical circuit design, e.g., cell, an array, a net, or array of nets and/or cells, the phase shapes. The assignment of phases or colors within a hierarchical unit will be correctly binary colored to satisfy the lithographic, manufacturability and other design rules, referred to collectively as coloring rules. During assembly with other units, the coloring of phases in a hierarchical unit may change (e.g., be reversed or flipped), but the correct binary colorability of a hierarchical unit is preserved, which simplifies assembly of the integrated circuit layout.

REFERENCES:
patent: 5883813 (1999-03-01), Kim et al.
patent: 6066180 (2000-05-01), Kim et al.
patent: 6609245 (2003-08-01), Liebmann et al.
patent: 6753115 (2004-06-01), Zhang et al.
patent: 6901576 (2005-05-01), Liebmann et al.
Alternating Phase Shifted Mask for Logic Gate Levels, Design and Mask Manufacturing, Lars Liebmann, Ioana Graur, William Leipold, James Oberschmidt, David O'Grady, Denis Regaill; IBM Microelectronics, East Fishkill; 12 pages.

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