Method and apparatus for applying charged particle beam

Details Method and apparatus for applying charged particle beam Method and apparatus for applying charged particle beam

2008-05-27

2008-05-27

Wells, Nikita (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S306000, C250S207000, C250S398000, C250S3960ML, C250S492200, C250S492220, C250S492300

Reexamination Certificate

active

11475014

ABSTRACT:
In a charged particle beam applying apparatus such as an electron beams lithography system, there is a technology that facilitates positional adjustment of a crossover and improves throughput of the apparatus. A front focal plane of a condenser lens is provided with a sharp end face (crossover regulation edge) for regulating the height of the crossover on a beam axis. By using the crossover regulation edge to measure the shape of an electron beam, the shape of the beam on the front focal plane of the condenser lens can be always checked even if the height of the crossover formed by an electron gun or the resistance of a source forming lens is changed.

REFERENCES:
patent: 2006/0056131 (2006-03-01), Tanimoto et al.
patent: 2002-267221 (2000-03-01), None
patent: 2002-319532 (2001-04-01), None
patent: 2006-080304 (2004-09-01), None

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