Photosensitive composition and method for forming pattern...

Details Photosensitive composition and method for forming pattern... Photosensitive composition and method for forming pattern...

2008-05-13

2008-05-13

Chu, John S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S910000, C526S256000, C526S266000, C526S270000, C526S309000, C560S120000, C560S126000, C560S128000

Reexamination Certificate

active

11167813

ABSTRACT:
A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.

REFERENCES:
patent: 6383713 (2002-05-01), Uetani et al.
patent: 6388101 (2002-05-01), Hada et al.
patent: 6517994 (2003-02-01), Watanabe
patent: 6639035 (2003-10-01), Chen et al.
patent: 6703178 (2004-03-01), Chen et al.
patent: 6844132 (2005-01-01), Kodama et al.
patent: 7033726 (2006-04-01), Nishimura et al.
patent: 2001/0026901 (2001-10-01), Maeda et al.
patent: 2002/0165328 (2002-11-01), Yamamoto et al.
patent: 2003/0010748 (2003-01-01), Kodama et al.
patent: 2003/0013039 (2003-01-01), Kobayashi et al.
patent: 1 179 750 (2002-02-01), None
patent: 1 338 922 (2003-08-01), None
patent: 1 352 904 (2003-10-01), None
patent: 9-73173 (1997-03-01), None
patent: 2000-159758 (2000-06-01), None
patent: 2001-109154 (2001-04-01), None
Partial European Search Report dated Nov. 25, 2005.
European Search Report issued Jan. 30, 2008.

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