Enhanced sampling methodology for semiconductor processing

Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element

Reexamination Certificate

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C702S084000, C716S030000

Reexamination Certificate

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11268236

ABSTRACT:
The present invention improves wafer sampling methods by partitioning a semiconductor wafer into a set of sampling regions and calculating yield of a sampling region(s) of the semiconductor wafer.

REFERENCES:
patent: 5773315 (1998-06-01), Jarvis
patent: 5793650 (1998-08-01), Mirza
patent: 6265232 (2001-07-01), Simmons
patent: 6311139 (2001-10-01), Kuroda et al.
patent: 6324481 (2001-11-01), Atchison et al.
patent: 6367040 (2002-04-01), Ott et al.
patent: 6496958 (2002-12-01), Ott et al.
patent: 6707936 (2004-03-01), Winter et al.
patent: 6885950 (2005-04-01), Mitsutake et al.

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