Semiconductor structure having thick stabilization layer

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S328000, C257S329000, C257S330000, C257S331000, C257S332000, C257S333000, C257S334000

Reexamination Certificate

active

10855794

ABSTRACT:
A semiconductor structure has a semiconductor substrate (3, 4), on/in whose top side a structure comprising semiconductor layers, metal layers and insulator layers (5) is applied/impressed. An as far as possible contiguous stabilization layer (6, 10) made of metal and/or passivation material is applied on the applied/impressed metal/semiconductor/insulator layer structure (5).

REFERENCES:
patent: 5602046 (1997-02-01), Calafut et al.
patent: 6015990 (2000-01-01), Hieda et al.
patent: 6066877 (2000-05-01), Williams et al.
patent: 2002/0030224 (2002-03-01), Hshieh et al.
patent: 2002/0142548 (2002-10-01), Takaishi
patent: 100 43 955 (2002-04-01), None

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