Semiconductor memory with virtual ground architecture

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S315000, C257S317000, C257S321000

Reexamination Certificate

active

10857637

ABSTRACT:
Insulation regions in the manner of STI isolations, which run transversely with respect to the word lines, isolate the source/drain regions of adjacent memory cells. Metallic bit lines are applied on the top side and patterned for example along zigzag lines such that the source/drain regions of a memory transistor which are contact-connected by the bit lines are in each case electrically connected by two mutually adjacent bit lines.

REFERENCES:
patent: 5671177 (1997-09-01), Ueki
patent: 5760437 (1998-06-01), Shimoji
patent: 5976930 (1999-11-01), Noble
patent: 6034894 (2000-03-01), Maruyama et al.
patent: 6936891 (2005-08-01), Saito et al.
patent: 2002/0149081 (2002-10-01), Goda et al.
patent: 2003/0007386 (2003-01-01), Georgakos et al.
patent: 09-082921 (1997-03-01), None
patent: 09-107087 (1997-04-01), None
patent: 2003-046002 (2003-02-01), None

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