Semiconductor device comprising thin film transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S059000, C257S072000, C257S350000, C257SE29151

Reexamination Certificate

active

11337514

ABSTRACT:
TFTs arranged in various circuits have structures that are suited for circuit functions, in order to improve operation characteristics and reliability of the semiconductor device, to lower consumption of electric power, to decrease the number of steps, to lower the cost of production and to improve the yield. The gradient of concentration of impurity element for controlling the conduction type in the LDD regions622and623of the TFT is such that the concentration increases toward the drain region. For this purpose, a tapered gate electrode607and a tapered gate-insulating film605are formed, and the ionized impurity element for controlling the conduction type is added to the semiconductor layer through the gate-insulating film605.

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