Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-10-30
2007-10-30
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S270100
Reexamination Certificate
active
11177738
ABSTRACT:
Disclosed herein is a top anti-reflective coating composition which comprises a photoacid generator represented by Formula 1 below.wherein n is between 7 and 25.Since the top anti-reflective coating composition dissolves a portion of a photoacid generator present at the top of an underlying photosensitizer, particularly, upon formation of a top anti-reflective coating, it can prevent the top from being formed into a thick section. Therefore, the use of the anti-reflective coating composition enables the formation of a vertical pattern on a semiconductor device.
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Bok Cheol Kyu
Jung Jae Chang
Kim Sam Young
Lim Chang Moon
Moon Seung Chan
Hamilton Cynthia
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
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