Photoacid generating polymer, its preparation method, top...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S273100, C430S272100, C430S904000, C430S950000, C430S961000, C526S243000, C526S259000, C522S904000

Reexamination Certificate

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11168102

ABSTRACT:
Disclosed herein is a photoacid generating polymer represented by Formula 1 below:wherein R1is a C1-10hydrocarbon or a C1-10hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; R2is hydrogen or a methyl group; and a, b, c and d represent the mole fraction of each monomer and are in the range between about 0.05 and about 0.9, such that the sum of a, b, c, and d equals one. Since the photoacid generating polymer of Formula 1 is not water-soluble and acts as a photoacid generator, it can be used to prepare a top anti-reflective coating composition for immersion lithography.

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