Positive resist composition and compound used therein

Details Positive resist composition and compound used therein Positive resist composition and compound used therein

2007-06-19

2007-06-19

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C524S303000

Reexamination Certificate

active

11137164

ABSTRACT:
A positive resist composition includes a resin component (A) which contains an acid dissociable dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and a compound (C) represented by a general formula (1) shown below:(wherein, each R1group and each R3group represents, independently, a hydrogen atom, an alkyl group of 1 to 3 carbon atoms, or a cycloalkyl group of 4 to 6 carbon atoms, provided at least one of the R1and R3groups is a cycloalkyl group of 4 to 6 carbon atoms, n represents an integer from 1 to 3, R2represents an alkyl group of 1 to 3 carbon atoms, and X represents an alkylene group of either 4 or 5 carbon atoms).

REFERENCES:
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patent: 6603029 (2003-08-01), Shiomi et al.
patent: 2002/0045123 (2002-04-01), Okubo et al.
patent: 0 709 736 (1996-05-01), None
patent: 4-211258 (1992-08-01), None
patent: 2006-206484 (2006-08-01), None
patent: WO 2006046383 (2006-05-01), None
European Search Report from corresponding European Patent Application Serial No. EP 05 10 4527.

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