Application of impressed-current cathodic protection to...

Details Application of impressed-current cathodic protection to... Application of impressed-current cathodic protection to...

2007-10-02

2007-10-02

Chen, Kin-Chan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S745000

Reexamination Certificate

active

10286626

ABSTRACT:
A new method is provided for the processing of metals, most notably copper, such that damage to exposed surfaces of these metals is prevented. During a step of semiconductor processing, which results in exposing a metal surface to a wet substance having a pH value, a voltage is applied to the metal that is exposed. The value of the applied voltage can, dependent on the value of the pH constant of the wet substance, be selected such that the exposed metal surface is protected against alkaline effects of the wet substance.

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patent: 2003/0092257 (2003-05-01), Cheng

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