Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-12-04
2007-12-04
Pert, Evan (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S288000, C257S368000, C257S405000, C257S406000, C257S411000
Reexamination Certificate
active
10848323
ABSTRACT:
A semiconductor storage element has a memory function body on opposite sides of a gate electrode formed on a semiconductor substrate. Each end of source/drain regions is located in the semiconductor substrate just under the memory function body and offset with respect to an edge of the gate electrode in a gate length direction to improve efficiency of electric charge injection into the memory function body. A storage state in the memory function body is found by detecting a amount of current between the source/drain regions, which current changes depending on the amount of the electric charge retained in the charge retention portion.
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Fujio Masuoka; A Handbook for Flash Memory Technology, K.K. Science Forum, Aug. 15, 1993, pp. 55-58.
Iwata Hiroshi
Ogura Takayuki
Shibata Akihide
Birch & Stewart Kolasch & Birch, LLP
Pert Evan
Sharp Kabushiki Kaisha
Tran Tan
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