Method and apparatus for simultaneously cleaning the front...

Details Method and apparatus for simultaneously cleaning the front... Method and apparatus for simultaneously cleaning the front...

2007-06-19

2007-06-19

Spisich, Mark (Department: 1744)

Brushing, scrubbing, and general cleaning

Machines

Brushing

C015S088300

Reexamination Certificate

active

10652648

ABSTRACT:
A method for cleaning a semiconductor substrate is provided. The method initiates with transferring the semiconductor substrate into a chamber. Then, a first side of the semiconductor substrate is cleaned according to a first cleaning technique. A second side of the semiconductor substrate is simultaneously cleaned according to a second cleaning technique. The semiconductor substrate is then transferred from the chamber. A system and apparatus for simultaneously cleaning opposing sides of a semiconductor substrate are also provided.

REFERENCES:
patent: 5660642 (1997-08-01), Britten
patent: 5675856 (1997-10-01), Itzkowitz
patent: 5906687 (1999-05-01), Masui et al.
patent: 6175983 (2001-01-01), Hirose et al.
patent: 6334229 (2002-01-01), Moinpour et al.
patent: 6951042 (2005-10-01), Mikhaylichenko et al.
patent: 2002/0062839 (2002-05-01), Verhaverbeke et al.
patent: 2-271622 (1990-11-01), None
patent: 00/59006 (2000-10-01), None

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