Positive-tone radiation-sensitive resin composition

Details Positive-tone radiation-sensitive resin composition Positive-tone radiation-sensitive resin composition

2007-08-21

2007-08-21

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S914000, C430S920000, C430S926000

Reexamination Certificate

active

11117344

ABSTRACT:
A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali when the acid-dissociable group dissociates is disclosed.wherein R1and R2are individually halogen atom, methyl, cyano, or nitro group, X is a C1-20organic group, and h and i are 0-4. The resin composition is useful as a chemically amplified positive-tone resist excelling in focal depth allowance, sensitivity, resolution, pattern profile, and PED stability.

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Shukla, “Synthesis of some new aryla-(3-substituted-carbazol-9-yl) acetates/propionates as possible anti-inflammatory and analgesic agents,” Indian Journal of Chemistry, vol. 33B, Aug. 1994, pp. 799-802.

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