Method and apparatus for capturing and using design intent...

Details Method and apparatus for capturing and using design intent... Method and apparatus for capturing and using design intent...

2007-12-25

2007-12-25

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S117000, C716S030000

Reexamination Certificate

active

10818929

ABSTRACT:
A method and apparatus for capturing and using design intent within an IC fabrication process. The design intent information is produced along with the design release by a design company. The design release and design intent information are coupled to an IC manufacturing facility where the design release is used for producing the layout of the integrated circuit and the design intent information is coupled to the equipment, especially the metrology equipment, within the IC manufacturing facility. As such, the design intent information can be used to optimize processing during IC fabrication to achieve optimization of the critical characteristics intended by the designer.

REFERENCES:
patent: 5519628 (1996-05-01), Russell et al.
patent: 6009251 (1999-12-01), Ho et al.
patent: 6370679 (2002-04-01), Chang et al.
patent: 6453452 (2002-09-01), Chang et al.
patent: 6470489 (2002-10-01), Chang et al.
patent: 6505327 (2003-01-01), Lin
patent: 6523162 (2003-02-01), Agrawal et al.
patent: 6523165 (2003-02-01), Liu et al.
patent: 6526547 (2003-02-01), Breiner et al.
patent: 6529621 (2003-03-01), Glasser et al.
patent: 7003749 (2006-02-01), Subasic et al.
patent: 2002/0083401 (2002-06-01), Breiner et al.
patent: 2004/0098391 (2004-05-01), Robertson et al.
patent: 2004/0107412 (2004-06-01), Pack et al.
patent: 2004/0117746 (2004-06-01), Narain et al.
patent: WO 00/36525 (2000-06-01), None
Depesa, et al., “Automated Critical Dimension and Registration Communication,” SPIE vol. 1604 11thAnnual BACUS Symposium on Photomask Technology, Sep. 1991, pp. 26-33.
Kahng, “IC Layout and Manufacturability: Critical Links and Design Flow Implications,” 12thInternational Conference on VSLI Design, 1999, pp. 100-105.
Ning, et al., “A Comparative Analysis of Run-to-Run Control Algorithms in the Semiconductor Manufacturing Industry,” 1996 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, Nov. 12, 1996, pp. 375-381.
European Search Report for 04008541.7, dated Apr. 25, 2004 (8410 EP).
Search report from Austrian Patent Office for Application No. 200401983-2 dated Jan. 20, 2006.

Affiliated with

Also associated with

Rating

Method and apparatus for capturing and using design intent... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for capturing and using design intent..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for capturing and using design intent... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3871486