Methods for use of pulsed voltage in a plasma reactor

Details Methods for use of pulsed voltage in a plasma reactor Methods for use of pulsed voltage in a plasma reactor

2007-08-07

2007-08-07

Vinh, Lan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S706000, C438S710000, C156S345230

Reexamination Certificate

active

10408542

ABSTRACT:
A method and apparatus for providing a positive voltage spike to a semiconductor substrate pedestal during a portion of a high voltage power bias oscillation cycle to reduce or eliminate the detrimental effects of feature charging during the operation of a plasma reactor.

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