Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-10-16
2007-10-16
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S331000, C430S311000, C430S905000, C430S914000, C430S966000, C430S945000, C430S942000, C430S919000, C430S909000, C526S307400, C526S307500
Reexamination Certificate
active
10875912
ABSTRACT:
The present invention relates to photoresist compositions for EUV and methods for forming photoresist patterns. More specifically, fine photoresist patterns: of less than 50 nm without collapse are formed with EUV (Extreme Ultraviolet) as an exposure light source by using a negative photoresist composition comprising a melamine derivative and polyvinylphenol.
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Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
Walke Amanda
LandOfFree
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