Method and system for context-specific mask inspection

Details Method and system for context-specific mask inspection Method and system for context-specific mask inspection

2007-06-12

2007-06-12

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

10620284

ABSTRACT:
A method for inspecting lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to inspect a mask.

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