Nitrogen-containing organic compound, resist composition and...

Details Nitrogen-containing organic compound, resist composition and... Nitrogen-containing organic compound, resist composition and...

2007-08-07

2007-08-07

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S926000, C548S304400, C546S273400

Reexamination Certificate

active

10974759

ABSTRACT:
Resist compositions comprising nitrogen-containing organic compounds having a benzimidazole structure and a specific ether chain moiety have an excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and are useful in microfabrication using electron beams or deep-UV light.

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