Method of forming a microlens array having a high fill factor

Details Method of forming a microlens array having a high fill factor Method of forming a microlens array having a high fill factor

2007-11-20

2007-11-20

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S330000, C430S394000, C216S026000

Reexamination Certificate

active

11270701

ABSTRACT:
A method of forming a microlens array includes preparing a substrate; fabricating a photosensitive array on the substrate; depositing a layer of lens material on the photosensitive array; depositing and patterning photoresist on the lens material, wherein patterning includes forming a photoresist region having a solid curved upper surface and a substantially rectangular base on the lens material layer; developing the photoresist; reflowing the photoresist; and processing the lens material for form a microlens array.

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patent: 6995911 (2006-02-01), Boettiger
patent: 7-198906 (1995-08-01), None

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