Method to create an alternate integrated circuit layout view...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Details

C345S419000, C345S420000, C345S653000, C345S655000, C345S679000, C715S782000

Reexamination Certificate

active

10941233

ABSTRACT:
A method in accordance with the present invention prepares an alternate view of an integrated circuit (IC) layout from a top view thereof by selecting an initial polygon representing and IC feature from the top view of the layout, where the initial polygon is defined by a plurality of initial points. The coordinates the plurality of initial points are mapped onto coordinates of a plurality of translated points that define a second polygon representing an alternate view of the initial polygon. The mapping uses at least one of either the height of the initial polygon or the width of the initial polygon. The method can be used, for example and without limitation, to generate a three dimensional view from the top view of the layout or a sectional view of the layout.

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