Monomer having fluorine-containing acetal or ketal...

Details Monomer having fluorine-containing acetal or ketal... Monomer having fluorine-containing acetal or ketal...

2007-06-19

2007-06-19

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S907000, C430S910000, C568S591000, C568S592000, C568S594000, C568S596000, C568S599000, C568S604000, C526S247000, C526S280000, C526S281000, C526S332000

Reexamination Certificate

active

10505799

ABSTRACT:
As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1):whereinR represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1and R2is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.

REFERENCES:
patent: 6830870 (2004-12-01), Malik et al.
patent: 2003/0059710 (2003-03-01), Inoue
patent: 2.178.724 (1972-04-01), None
patent: 50-143888 (1975-11-01), None
patent: 2002-201219 (2002-07-01), None
Hrabak et al (“Preparation and Properties of 1-Ethoxy-2,2,2-Trifluoroethyl Esters of Acrylic and Methacrylic Acids and of Their Polymers”, Journal of Polymer Science: Part A: Polymer Chemistry, vol. 26, p. 267-274 (1988).

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