Positive resist composition

Details Positive resist composition Positive resist composition

2007-08-14

2007-08-14

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S907000

Reexamination Certificate

active

10244070

ABSTRACT:
A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.

REFERENCES:
patent: 5876900 (1999-03-01), Watanabe et al.
patent: 6042991 (2000-03-01), Aoai et al.
patent: 6106993 (2000-08-01), Watanabe et al.
patent: 6291130 (2001-09-01), Kodama et al.
patent: 6479211 (2002-11-01), Sato et al.
patent: 6511785 (2003-01-01), Takemura et al.
patent: 6605408 (2003-08-01), Nishi et al.
patent: 2001/0008739 (2001-07-01), Nishiyama et al.
patent: 2001/0026901 (2001-10-01), Maeda et al.
patent: 0 520 654 (1992-12-01), None
patent: 0 788 031 (1997-08-01), None
patent: 0 803 775 (1997-10-01), None
patent: 0 869 393 (1998-10-01), None
patent: 1 122 604 (2001-08-01), None
patent: 5-173333 (1993-07-01), None
patent: 9-50126 (1997-02-01), None
patent: 9-274320 (1997-10-01), None
patent: 10-265524 (1998-10-01), None
patent: 2000-66382 (2000-03-01), None
patent: 2000-298349 (2000-10-01), None
patent: 2001-83709 (2001-03-01), None
patent: 2001-1422199 (2001-05-01), None
patent: WO 00/01684 (2000-01-01), None
Machine-assisted English translation for JP 9-50126, provided by JPO.
European Search Report dated Dec. 20, 2002.

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