Multi-layer integrated circuit package

Active solid-state devices (e.g. – transistors – solid-state diode – Physical configuration of semiconductor – With electrical contact in hole in semiconductor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S112000

Reexamination Certificate

active

10915803

ABSTRACT:
Adhesive material is applied to a surface of a metallic core layer. The adhesive material is removed from a conductive region of the metallic core layer. A metallic contact is provided over the conductive region of the metallic core layer. The metallic core layer is laminated to an imprinted buildup layer, the buildup layer having a dielectric region and a conductive region, wherein a nonconductive region of the metallic core layer is bonded to the dielectric region of the buildup layer and the conductive region of the metallic core layer is bonded to the conductive region of the imprinted-buildup layer.

REFERENCES:
patent: 4146440 (1979-03-01), Thompson
patent: 5917157 (1999-06-01), Remsburg
patent: 6204089 (2001-03-01), Wang
patent: 6326555 (2001-12-01), McCormack et al.
patent: 6328201 (2001-12-01), Inoue et al.
patent: 6395582 (2002-05-01), Sohn et al.
patent: 6525921 (2003-02-01), Nakatani et al.
patent: 6585903 (2003-07-01), Belke, Jr. et al.
patent: 2002/0029906 (2002-03-01), Echigo et al.
patent: 1069811 (2001-01-01), None
patent: 1154480 (2001-11-01), None
patent: 2001-015877 (2001-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Multi-layer integrated circuit package does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-layer integrated circuit package, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-layer integrated circuit package will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3821655

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.