Megasonic immersion lithography exposure apparatus and method

Details Megasonic immersion lithography exposure apparatus and method Megasonic immersion lithography exposure apparatus and method

2007-05-29

2007-05-29

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S067000

Reexamination Certificate

active

10910480

ABSTRACT:
A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer.An optical transfer chamber is provided adjacent to the optical system for containing an exposure liquid. At least one megasonic plate operably engages the optical transfer chamber for inducing sonic waves in and eliminating microbubbles from the exposure liquid.

REFERENCES:
patent: 5610683 (1997-03-01), Takahashi
patent: 2004/0247790 (2004-12-01), Moriyama
patent: 2005/0048223 (2005-03-01), Pawloski et al.
patent: 2005/0134817 (2005-06-01), Nakamura
patent: 2005/0225734 (2005-10-01), De Smit et al.

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