Shallow junction semiconductor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S408000

Reexamination Certificate

active

11307537

ABSTRACT:
An integrated circuit with a semiconductor substrate is provided. A gate dielectric is on the semiconductor substrate, and a gate is on the gate dielectric. A silicide layer is on the semiconductor substrate adjacent the gate and the gate dielectric. The silicide layer incorporates a substantially uniformly distributed and concentrated dopant therein. A shallow source/drain junction is beneath the salicide layer. An interlayer dielectric is above the semiconductor substrate, and contacts are in the interlayer dielectric to the salicide layer.

REFERENCES:
patent: 4692348 (1987-09-01), Rubloff et al.
patent: 5395787 (1995-03-01), Lee et al.
patent: 6136636 (2000-10-01), Wu
patent: 6326251 (2001-12-01), Gardner et al.
patent: 6555438 (2003-04-01), Wu
patent: 6613623 (2003-09-01), Tsai et al.
patent: 6873057 (2005-03-01), Chen et al.
patent: 7033916 (2006-04-01), Pelella et al.

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