Polishing pad with transparent window having reduced window...

Details Polishing pad with transparent window having reduced window... Polishing pad with transparent window having reduced window...

2007-03-13

2007-03-13

Ackun, Jr., Jacob K. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S921000, C451S285000, C451S289000, C451S041000

Reexamination Certificate

active

10391095

ABSTRACT:
The polishing pad for a chemical mechanical polishing apparatus and method of making the same has a polishing pad with a bottom layer, a polishing surface on a top layer and a transparent sheet of material interposed between the two layers. Slurry from the chemical mechanical polishing process is prevented from penetrating the impermeable transparent sheet to the bottom layer of the polishing pad.

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