Photomask for forming small contact hole array and methods...

Details Photomask for forming small contact hole array and methods... Photomask for forming small contact hole array and methods...

2007-11-27

2007-11-27

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S319000, C430S320000, C430S325000

Reexamination Certificate

active

11328788

ABSTRACT:
Photomasks that are used to form a fine contact hole array, a method of fabricating the photomask, and use of the photomask. The photomask includes a transparent substrate; a plurality of line-type opaque patterns being formed on the transparent substrate, for defining floodlighting portions for forming patterns; and phase-shifting regions being arranged on the transparent substrate between the opaque patterns at predetermined intervals, the phase-shifting regions defining floodlighting portions for contact holes. A fine and dense contact hole array can be easily formed using the photomask together with a customized illumination. Therefore, a fine contact hole of a good quality can be formed directly on a photoresist using the photomask without additional processes.

REFERENCES:
patent: 6114095 (2000-09-01), Nakabayashi et al.
patent: 6524751 (2003-02-01), Stanton et al.
patent: 7022438 (2006-04-01), Kim

Affiliated with

Also associated with

Rating

Photomask for forming small contact hole array and methods... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask for forming small contact hole array and methods..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask for forming small contact hole array and methods... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3805588