Process for treating a substrate with a plasma

Details Process for treating a substrate with a plasma Process for treating a substrate with a plasma

2007-09-04

2007-09-04

Padgett, Marianne (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S131000, C427S249700, C427S132000, C427S578000

Reexamination Certificate

active

09412510

ABSTRACT:
A process for depositing a diamond-like carbon film, which comprises providing a means for generating a sheet-like beam-type plasma region inside a vacuum vessel for depositing the diamond-like carbon film, and depositing the film on a substrate being moved through said plasma region. Also claimed is an apparatus for fabricating a magnetic recording medium by sequentially and continuously forming a magnetic layer and a diamond-like carbon film on a polymer substrate material, which comprises at least a first vacuum vessel for forming the magnetic layer of the magnetic recording medium and a second vacuum vessel for forming the diamond-like carbon film, provided that the pressure difference between the operation pressures for the first vessel and the second vessel is set in the range of from 10−2to 10−5Torr.

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