Stacked polyurethane polishing pad and method of producing...

Details Stacked polyurethane polishing pad and method of producing... Stacked polyurethane polishing pad and method of producing...

2007-03-13

2007-03-13

Ackun, Jr., Jacob K. (Department: 3723)

Abrading

Flexible-member tool, per se

Laminate

Reexamination Certificate

active

10924834

ABSTRACT:
A polishing pad has a sublayer; a top layer attached to the sublayer, the sublayer having a modulus of elasticity between 300 and 5000 psi and a compressibility of less than 30% at 73 psi, wherein the top pad has a modulus of elasticity which is greater than the modulus of elasticity of the sublayer and a compressibility which is smaller than a compressibility of the sublayer.

REFERENCES:
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patent: 2004/0055223 (2004-03-01), Ono et al.
patent: 2005/0064709 (2005-03-01), Shimomura et al.
patent: 2005/0221723 (2005-10-01), Duboust et al.
patent: 2000 202763 (2000-07-01), None
patent: WO 03/043071 (2003-05-01), None
Patent Abstracts of Japan, vol. 2000, No. 10, Nov. 17, 2000.

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