Alkaline developer for radiation sensitive compositions

Details Alkaline developer for radiation sensitive compositions Alkaline developer for radiation sensitive compositions

2007-03-06

2007-03-06

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

C430S302000, C510S175000, C510S180000, C510S181000

Reexamination Certificate

active

10956871

ABSTRACT:
The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.

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Search Report for EP 03 10 3643 (Mar. 5, 2004).

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