Negative resist composition comprising hydroxy-substituted...

Details Negative resist composition comprising hydroxy-substituted... Negative resist composition comprising hydroxy-substituted...

2007-09-18

2007-09-18

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S905000, C430S910000, C430S914000, C430S921000, C430S925000, C430S945000

Reexamination Certificate

active

11175651

ABSTRACT:
A negative resist composition and a method for patterning semiconductor devices using the composition are provided. The negative resist composition contains an alkali-soluble hydroxy-substituted base polymer, a silicon-containing crosslinker having an epoxy ring, and a photoacid generator. In the method for patterning semiconductor devices, fine patterns are formed according to a bi-layer resist process using the negative resist composition.

REFERENCES:
patent: 5736619 (1998-04-01), Kane et al.
patent: 5981141 (1999-11-01), Choi et al.
patent: 6187834 (2001-02-01), Thayer et al.
patent: 6210856 (2001-04-01), Lin et al.
patent: 6787455 (2004-09-01), Tsai et al.

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