Projection objective, especially for microlithography, and...

Details Projection objective, especially for microlithography, and... Projection objective, especially for microlithography, and...

2007-04-24

2007-04-24

Lester, Evelyn A. (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S650000, C359S651000, C359S656000, C359S798000, C359S804000, C359S675000, C359S379000, C359S381000, C359S392000, C359S396000

Reexamination Certificate

active

10448339

ABSTRACT:
A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.

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