Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S409000

Reexamination Certificate

active

10935177

ABSTRACT:
A thin film transistor of the present invention has an active layer including at least source, drain and channel regions formed on an insulating surface. A high resistivity region is formed between the channel region and each of the source and drain regions. A film capable of trapping positive charges therein is provided on at least the high resistivity region so that N-type conductivity is induced in the high resistivity region. Accordingly, the reliability of N-channel type TFT against hot electrons can be improved.

REFERENCES:
patent: 3597667 (1971-08-01), Horn
patent: 4313782 (1982-02-01), Sokoloski
patent: 4347586 (1982-08-01), Natsui
patent: 4409724 (1983-10-01), Tasch, Jr. et al.
patent: 4447272 (1984-05-01), Saks
patent: 4566175 (1986-01-01), Smayling et al.
patent: 4651406 (1987-03-01), Shimizu et al.
patent: 4808845 (1989-02-01), Suzuki et al.
patent: 4823180 (1989-04-01), Wieder et al.
patent: 4851370 (1989-07-01), Doklan et al.
patent: 4886962 (1989-12-01), Gofuku et al.
patent: 4951100 (1990-08-01), Parrillo
patent: 5102813 (1992-04-01), Kobayashi et al.
patent: 5113511 (1992-05-01), Nelson et al.
patent: 5142344 (1992-08-01), Yamazaki
patent: 5169792 (1992-12-01), Katoh et al.
patent: 5191373 (1993-03-01), Nakano
patent: 5212119 (1993-05-01), Hah et al.
patent: 5292675 (1994-03-01), Codama
patent: 5306651 (1994-04-01), Masumo et al.
patent: 5308998 (1994-05-01), Yamazaki et al.
patent: 5324974 (1994-06-01), Liao
patent: 5343066 (1994-08-01), Okamoto et al.
patent: 5365079 (1994-11-01), Kodaira et al.
patent: 5426315 (1995-06-01), Pfiester
patent: 5440163 (1995-08-01), Ohhashi
patent: 5444457 (1995-08-01), Hotto
patent: 5466617 (1995-11-01), Shannon
patent: 5468987 (1995-11-01), Yamazaki et al.
patent: 5476802 (1995-12-01), Yamazaki et al.
patent: 5485019 (1996-01-01), Yamazaki et al.
patent: 5497021 (1996-03-01), Tada
patent: 5504020 (1996-04-01), Aomori
patent: 5508209 (1996-04-01), Zhang et al.
patent: 5521107 (1996-05-01), Yamazaki et al.
patent: 5523257 (1996-06-01), Yamazaki et al.
patent: 5545577 (1996-08-01), Tada
patent: 5563427 (1996-10-01), Yudasaka et al.
patent: 5576655 (1996-11-01), Fujihira et al.
patent: 5580381 (1996-12-01), Yamagata
patent: 5623157 (1997-04-01), Miyazaki et al.
patent: 5650338 (1997-07-01), Yamazaki et al.
patent: 5719065 (1998-02-01), Takemura et al.
patent: 5804878 (1998-09-01), Miyazaki et al.
patent: 5849611 (1998-12-01), Yamazaki et al.
patent: 5879969 (1999-03-01), Yamazaki et al.
patent: 5913112 (1999-06-01), Yamazaki et al.
patent: 5917225 (1999-06-01), Yamazaki et al.
patent: 5945711 (1999-08-01), Takemura et al.
patent: 5962870 (1999-10-01), Yamazaki et al.
patent: 5962872 (1999-10-01), Zhang et al.
patent: 6013928 (2000-01-01), Yamazaki et al.
patent: 6031290 (2000-02-01), Miyazaki et al.
patent: 6078316 (2000-06-01), Page et al.
patent: 6147375 (2000-11-01), Yamazaki et al.
patent: 6166414 (2000-12-01), Miyazaki et al.
patent: 6335555 (2002-01-01), Takemura et al.
patent: 6448612 (2002-09-01), Miyazaki et al.
patent: 6476447 (2002-11-01), Yamazaki et al.
patent: 6556257 (2003-04-01), Ino
patent: 6566711 (2003-05-01), Yamazaki et al.
patent: 6608353 (2003-08-01), Miyazaki et al.
patent: 6624450 (2003-09-01), Yamazaki et al.
patent: 6875999 (2005-04-01), Koyama et al.
patent: 6972435 (2005-12-01), Ohtani
patent: 2002/0051382 (2002-05-01), Matsubara et al.
patent: 2002/0163043 (2002-11-01), Zhang et al.
patent: 2002/0179969 (2002-12-01), Miyazaki et al.
patent: 2003/0173570 (2003-09-01), Yamazaki et al.
patent: 2004/0023445 (2004-02-01), Miyazaki et al.
patent: 2004/0051102 (2004-03-01), Miyazaki et al.
patent: 55-041703 (1980-03-01), None
patent: 56-081973 (1981-07-01), None
patent: 56-111258 (1981-09-01), None
patent: 57-058363 (1982-04-01), None
patent: 57-104218 (1982-06-01), None
patent: 58-037967 (1983-03-01), None
patent: 60-136259 (1985-07-01), None
patent: 60-202931 (1985-10-01), None
patent: 61-220341 (1986-09-01), None
patent: 62-084562 (1987-04-01), None
patent: 63-314862 (1988-12-01), None
patent: 64-054762 (1989-03-01), None
patent: 02-159730 (1990-06-01), None
patent: 03-020046 (1991-01-01), None
patent: 03-095938 (1991-04-01), None
patent: 03-095939 (1991-04-01), None
patent: 03-280420 (1991-12-01), None
patent: 04-180219 (1992-06-01), None
patent: 04-196328 (1992-07-01), None
patent: 04-239731 (1992-08-01), None
patent: 04-299566 (1992-10-01), None
patent: 05-055581 (1993-03-01), None
patent: 05-055582 (1993-03-01), None
patent: 05-082442 (1993-04-01), None
patent: 05-114724 (1993-05-01), None
patent: 05-226364 (1993-09-01), None
patent: 05-232515 (1993-09-01), None
patent: 05-259458 (1993-10-01), None
patent: 06-169086 (1994-06-01), None
patent: 06-232160 (1994-08-01), None
patent: 06-291314 (1994-10-01), None
patent: WO 96-14268 (1992-08-01), None
Okuyama et al., “Water-Related Threshold Voltage Instability of Polysilicon TFTs,” pp. 527-530, 1993, IEDM 93.
Bonnel et al., “Si Poly TFT's with Low Off Current for Flat Panel Displays,” pp. 199-202, 1993, Euro Display '93.
Shimoyama et al., “Increased Hot-Carrier Degradation Due to Water in TEOS/O3-Oxide,” p. 723, 1992, Extended Abstracts (The 39thSpring Meeting, 1992); The Japan Society of Applied Physics and Related Societies, No. 2, 30p-ZM-3, (English Abstract only).
Shimoyama et al., “Increased Hot-Carrier Degradation Due to Water in TEOS/O3-Oxide(2)-Water Blocking Effect of an ECR-SiO2 Film Under TEOS/O3-Oxide and Improvement of Hot-Carrier Tolerance,” p. 723, 1992, Extended Abstracts (The 39thSpring Meeting); The Japan Society of Applied Physics and Related Societies, No. 2, 30p-ZM-4, (English Abstract).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3782811

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.