Thin-film deposition apparatus

Details Thin-film deposition apparatus Thin-film deposition apparatus

2007-09-25

2007-09-25

Zervigon, Rudy (Department: 1763)

Coating apparatus

Gas or vapor deposition

C156S345330, C156S345340

Reexamination Certificate

active

10824798

ABSTRACT:
A gas-feeding apparatus configured to be connected to an evacuatable reaction chamber includes a gas-distribution head for introducing gases into the chamber through a head surface. The gas-feeding head includes a first section for discharging a gas through the head surface toward a susceptor and a second section for discharging a gas through the head surface toward the susceptor. The first and the second sections are isolated from each other in the gas-distribution head, at least one of which section is coupled to an exhaust system for purging therefrom a gas present in the corresponding section without passing through the head surface.

REFERENCES:
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patent: 5685914 (1997-11-01), Hills et al.
patent: 5884009 (1999-03-01), Okase
patent: 6435428 (2002-08-01), Kim et al.
patent: 2003/0143328 (2003-07-01), Chen et al.
patent: 2005/0208217 (2005-09-01), Shinriki et al.
U.S. Appl. No. 10/728,126, filed Dec. 3, 2003, Ernst H.A. Granneman.
U.S. Appl. No. 10/782,727, filed Feb. 18, 2004, Lindfors, et al.

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