Intermediate layer composition for multilayer resist...

Details Intermediate layer composition for multilayer resist... Intermediate layer composition for multilayer resist...

2007-01-02

2007-01-02

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S905000, C522S148000, C522S172000, C522S038000

Reexamination Certificate

active

10883831

ABSTRACT:
An intermediate layer composition having a silicon-containing polymer(A) having a specific structure and a pattern-forming process using the same.

REFERENCES:
patent: 6897004 (2005-05-01), Uenishi et al.
patent: B 4-43264 (1992-07-01), None
patent: B 4-44741 (1992-07-01), None
patent: B 6-38400 (1994-05-01), None
patent: 2573371 (1996-10-01), None
patent: 2641644 (1997-05-01), None
patent: 2901044 (1999-03-01), None

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