Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-04-24
2007-04-24
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S910000, C430S914000, C430S921000, C430S925000, C430S325000, C430S326000, C430S330000, C430S331000, C430S311000, C430S319000, C526S281000
Reexamination Certificate
active
10080507
ABSTRACT:
The present invention discloses a cross-linking monomer represented by the following Chemical Formula 1, a process for preparing a photoresist polymer using the same, and said photoresist polymer:<Chemical Formula>wherein, R′ and R″ individually represent hydrogen or methyl; m represents a number of 1 to 10; and R is selected from the group consisting of straight or branched C1-10alkyl, straight or branched C1-10ester, straight or branched C1-10ketone, straight or branched C1-10carboxylic acid, straight or branched C1-10acetal, straight or branched C1-10alkyl including at least one hydroxyl group, straight or branched C1-10ester including at least one hydroxyl group, straight or branched C1-10ketone including at least one hydroxyl group, straight or branched C1-10carboxylic acid including at least one hydroxyl group, and straight or branched C1-10acetal including at least one hydroxyl group.
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Balk Ki Ho
Jung Jae Chang
Jung Min Ho
Kong Keun Kyu
Lee Geun Su
Hynix / Semiconductor Inc.
Lee Sin
Townsend and Townsend / and Crew LLP
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