Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-03-13
2007-03-13
Ahmed, Samir (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C348S126000, C714S724000
Reexamination Certificate
active
10312632
ABSTRACT:
A customizing method includes steps which consist in: a) determining on the basis of a circuit model, a set of vectors each corresponding to a theoretical operating time of the circuit when a predetermined sequence of tests is applied, the coefficients of each vector representing the state of a common set of elements of the circuit among which the element to be customized (12); b) defining on the basis of a comparison of vectors, a composite of logic operators applied on the vectors and enabling to extract the coefficient corresponding to the element to be customized (30); c) producing images of the operating circuit at times corresponding to the vectors whereon is applied the composite of logic operators (32); and d) graphically combining the images produced in accordance with a composite of graphic operators corresponding to the composite of logic operators (36).
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K. Nikawa et al., “VLSI Fault Localization Using Electron Beam Voltage Contrast Image.O-Novel Image Acquisition and Localization Method.” Japanese Journal of Applied Physics, JP, Publication Office Japanese Journal of Applied Physics. Tokyo, vol. 31, No. 12B, Part 01, Dec. 1, 1992, pp. 4525-4530. XP000415470, ISSN: 0021-4922 le document en entier.
Desplats Romain
Perdu Philippe
Ahmed Samir
Centre National d'Etudes Spatiales
Kim Charles
Young & Thompson
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